Sina Femtosecond Laser Source 10W 30W 40W
Sina Femtosecond Laser cum infrared pro Laser Cutting, Welding, Micro Processing...
Huaray Laser (A societas investita JCZ) evolvit et fabricat certa laser HR-Femto femto secondo laserarum fibra femto-gradus secundus.Ponuntur in HR-Femto-10 (10 μJ), HR-Femto-50 (50 μJ), et HR-Femto-50HE (80 μJ), series, quae verificatur, certissima, adhiberi potest 24/ 7.Pulsus laser inversae <350 fs vel <350 fs ad 5 ps adaptabiles sunt.Greenlight aequalitates output possunt utendo harmonica generantis (SHG).
Specifications
Series HR-Femto-50 femto secundae industriae lasers probatur, maxime certa, et ad operationem 24/7 designata sunt.Laser subsidia >60 W potentia ad 1035 nm necem, >80 µJ energiam pulsus unicam, latitudines leguminis aptabiles
Marisque:
- Ad LX W mediocris potentia
- Unius energiae pulsus usque ad 80 μJ
- - 1 Hz - 1 MHz Adjustable Repeat Frequency
- Sustinet plures Bursus Modus junctiones
- Lego pulsus pulsus pro in-demanda fissilis
- Rugged, industriarum una-pars design
- ShG moduli libitum ad lucem viridis output support
Applicationem Field:
- EXERCITATIO et excisio materiae durae et fragilis
- Vitrum Welding
- Micro fabrica materiae metallicae
- Composita processus materialis amet
- New Energy Materials Processing
- Processus et tractatio polymerorum
- Medical fabrica fabricandis
- Fibre Optic Grating Writing
| SPECIFICATIONS | HR-Femto-IR-50-40 | HR-Femto-IR-80-60 | HR-Femto-GN-25-20 | HR-Femto-GN-30-24 |
| Centrum Necem | 1035 nm | 1035 nm | 517nm | 517nm |
| Mediocris Power | 40 W | 60 W | 20 W | 24 W |
| Pulsus Energy | 50 μJ @ 800 kHz | 80 μJ @ 750 kHz | 25 μJ @ 800 kHz | 30 μJ @750 kHz |
| Pulsus duratione | ||||
| Burst Energy | 200 μJ | 320 μJ | 100 μJ | 120 μJ |
| Apicem Power | >140 MW | >220 MW | >70 MW | >110 MW |
| Repetitio Rate | I iaculat MHz | I iaculat MHz | I iaculat MHz | I iaculat MHz |
| Beam Quality | M2≤1.3 | M2≤1.3 | M2≤1.3 | M2≤1.3 |
| trabem Divergentiam | ||||
| Tignum Circularity | ≥90% | ≥90% | ≥90% | ≥90% |
| Diameter Diameter | 3 ± 1 mm, 1/e2 | 3 ± 1 mm, 1/e2 | 3 ± 1 mm, 1/e2 | 4 ± 2 mm, 1/e2 |
| Polarizatio publica | Linear | Linear | Linear | Linear |
| Pulsus Stabilitas | <2% RMS | <2% RMS | <2% RMS | <2% RMS |
| Virtus Stabilitas | <2% RMS | <2% RMS | <2% RMS | <2% RMS |
| Operans Temp | 10 ad 30 °C | 10 ad 30 °C | 10 ad 30 °C | 10 ad 30 °C |
HR-Femto-X series fibri industrialis femto-secundae lasers designantur cum integratione optica et electricali, stabili et certa effectione, et praestari potest ad 24 horas diei laborandum.Sustinet output of >10 W ad 1035 nm fluctuantem ac singularem energiam pulsus >10 µJ et adhiberi potest cum multiplicatore externo ad exitum 517 nm adaequationis output.Haec productorum series non solum in investigationibus industrialibus et scientificis adhiberi potest, sed etiam in campo biophotonicorum et medicina photo.
Marisque:
- Integrated design of light and electricity
- subsidia frequentiis ex I Hz ad I MHz repetere Novifacta
- Sustinet mediocris potentia et pulsus industria moderatio
- Pulsus latitudo - sustinet unum-button operationis
- Quod constructum- in optica solitudo fabrica
- Suscipe adsum commutatione munus (libitum)
Applicationem Field:
- Subtilitas parvarum vestigium
- Superficies materialis modificatio
- duos photon parvarum nanometer processus
- optical repono
- minimum imaginatio
- oculus surgery
| SPECIFICATIONS | HR-Femto-IR-10-10 | HR-Femto-GN-4-4 |
| Necem | 1035 nm | 517 nm |
| Mediocris Power | 10 W | 4 W |
| Pulsus Energy | 10 μJ @1 MHz | 4 μJ @1 MHz |
| Pulsus duratione | ||
| Apicem Power | >25 MW | >10 MW |
| Repetitio Rate | Una iaculat ad I MHz | Una iaculat ad I MHz |
| Beam Quality | M2≤1.3 (Typical <1.2) | M2≤1.3 (Typical <1.2) |
| trabem Divergentiam | ||
| Tignum Circularity | ≥90% | ≥90% |
| Diameter Diameter | 3 ± 1 mm, 1/e2 | 3 ± 1 mm, 1/e2 |
| Polarizatio publica | Linear | Linear |
| Pulsus Stabilitas | <2% RMS | <2% RMS |
| Virtus Stabilitas | <2% RMS | <2% RMS |
| Operans Temp | 10 ad 30 °C | 10 ad 30 °C |
Series HR-Femto-200 femto secundae laserorum stabilia et certa sunt lasers femto-secunda ab Huaray evoluta, et sunt effectus Nationalis Investigationis et Programma Key.Laser consilium opticum et electricum integratum adoptat cum pulsus latitudine pauciorum quam 350 fs, unius energiae pulsus 200 μJ, et subsidium Burst Modi.Producti late adhiberi possunt in processu lagani semiconductoris, processus ceramici et polymerorum, processus adamantis, novae materiae energiae processus, processus metalli duri ad processum, polymerus materiae processus et curatio, et alii agri.
Marisque:
- Unius energiae pulsus usque ad 200 μJ
- Pulsus latitudo minus quam CCCL fs
- Support pro Gaudete Modus
- Integrated optical and electrical design
- Una tactus operatio sine nodi tionibus
- inaedificata optica solitudo fabrica
- inaedificata pulsus electrix
Applicationem Field:
- Semiconductor Wafer Processing
- Ceramics and Polymerus Processing
- Diamond processui
- New Energy Materials Processing
- Difficile metalworking
- Processus et tractatio polymerorum
| SPECIFICATIONS | HR-Femto-IR-200-35 |
| Necem | 1035 nm |
| Mediocris Power | 35 W |
| Pulsus Energy | 200 μJ @ 175 kHz |
| Pulsus duratione | |
| Apicem Power | >570 MW |
| Repetitio Rate | I iaculat MHz |
| Beam Quality | M2≤1.3 |
| trabem Divergentiam | |
| Tignum Circularity | ≥85% |
| Diameter Diameter | 4 ± 1 mm, 1/e2 |
| Polarizatio publica | Linear |
| Pulsus Stabilitas | <2% RMS |
| Virtus Stabilitas | <2% RMS |
| Operans Temp | 10 ad 30 °C |
| Externi Comms | RS-232, Ethernet, USB |
Product Dimension
